The new systems will help to accelerate production of memory devices using advanced technology with high yields.
“Our customer continues to introduce the most advanced memory for innovative, high performance devices. AIXTRON is pleased to further support their plans by introducing new applications and material systems to address new challenges in the field of advanced technology nodes,” comments Bill Bentinck, Vice President and General Manager of AIXTRON Inc., USA.
As silicon semiconductor devices approach the atomic scale, manufacturers need technologies that can apply precise layers of dielectric, metal and non-volatile memory material. The QXP-8300 ALD system includes patented TriJet vaporizer technology integrated with AIXTRON’s patented Close Coupled Showerhead principle that allows the use of low vapor pressure precursors as needed in some ultra-high-k dielectric and metal nitride recipes for memory capacitors.