ZEISS technical specialists will be participating in the meeting and discussing advances in applications of helium–neon ion microscopy, as well as automated correlative tomography workflows between X-ray microscopy and FIB-SEM. On display will be ZEISS FIB-SEM Crossbeam 340 and Crossbeam 540, as well as additional video presentations on electron microscopes.
Featuring a modular platform concept and open and easily extendable software architecture, the ZEISS FIB-SEM Crossbeam 340 and Crossbeam 540 on display are ideal for high throughput nanotomography and nanofabrication of even the most demanding, charging, or magnetic samples.
These 3D nano-workstations speed up nanotomography and nanofabrication applications. Combining the Gemini electron beam column’s 3D imaging technology and analytical performance with the focused ion beam’s material processing, research and sample preparation capabilities on a nanoscopic scale, these SEMs offer outstanding performance, maximum stability, and a uniform beam profile. The easy to understand graphical control interface facilitates real time interaction.
Crossbeam 340’s GEMINI I VP (variable pressure) column offers optimal analysis conditions for in situ experiments with outgassing and charging specimens. With the GEMINI II column with double condenser system, Crossbeam 540 enables users to benefit from more information in a shorter time. The system delivers high resolution, even with low voltage and high beam current, enabling fast analytics and ease of use.